Article
  • Effect of Poly(vinyl alcohol) and Poly(vinyl alcohol) Mono Thiol on the Stability Properties of Poly(vinyl acetate) Latex
  • Lee SY, Park LS
  • 폴리비닐알코올과 폴리비닐알코올모노티올이 폴리초산비닐 라텍스의 안정성에 미치는 영향
  • 이서용, 박이순
Abstract
The effects of protective colloids on the colloid stability of poly(vinyl acetate)(PVAc) latex was investigated. The stability of PVAc latex in reactive poly(vinyl alcohol) mono thiol(PVALT)(DP=1080) having 78.4% saponification value was better than poly(vinyl alcohol)(PVA)(DP=1100) having 81.6% saponification value. The colloidal stability of PVAc latex particles improved drastically with increase of the reactive PVALT. The partical surface morphology of PVAc latex was examined by trnasmission electron microscopy(TEM). It was shown that particle size of the latexes decreased with increasing reactive PVALT concentration. Therefore, the stabilities of latex for reactive PLAVT protective colloid was superior to that of PVA ones. This result is due to the introduction of many thiol froups that induce chemical bonds at PVAc latexes surface, so that the formation of PVALT-b-PVAc block copolymer via the reaction of PVAc with reactive PVALT. In addition, zeta potential of the PVAc latexes decreased with increasing sodium carbonate concentration.

보호콜로이드에 따른 입체 안정제(steric stabilizer)작용이 폴리초산비닐(poly(vinyl acetate), PVAc)라텍스의 안정성에 미치는 영향을 조사하였다. 보호콜로이드로서 중합도 1080, 검화도 78.4%인 반응성 poly(vinyl alcohol) mono thiol(PVALT)를 사용한 것이 중합도 1100, 검화도 81.6%인 poly(vinyl alcohol)(PVA)를 사용하는 것보다 PVAc라텍스의 안정성이 양호하였으며, 반응성 PVALT의 첨가량이 증가할수록 PVAc 라텍스의 안정성은 향상되었다. PVAc 라텍스 입자의

Keywords: protective colloid; poly(vinyl alcohol); poly(vinyl alcohol) mono thiol; poly(vinyl acetate); latex stability

  • Polymer(Korea) 폴리머
  • Frequency : Bimonthly(odd)
    ISSN 0379-153X(Print)
    ISSN 2234-8077(Online)
    Abbr. Polym. Korea
  • 2018 Impact Factor : 0.500
  • Indexed in SCIE

This Article

  • 2000; 24(5): 579-588

    Published online Sep 25, 2000

  • 10.7317/pk.
  • Received on Nov 30, -0001
  • Revised on Nov 30, -0001
  • Accepted on Nov 30, -0001

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