Article
  • Catalytic Chain Length and Characteristic Curve in a Chemical Amplification Photoresist Using Sulfonate Photoacid Generator
  • Yang SK, Park CE, Ahn KD
  • Sulfonate광산발생제를 사용하는 화학증폭 포토레지스트의 Catalytic Chain Length 및 특성곡선
  • 양승관, 박찬언, 안광덕
References
  • 1. Powell MW, Solid State Technol., 66 (1989)
  •  
  • 2. Iwayanagi T, Ueno T, Nonogaki S, Ito H, Willson CGElectronic and Photonic Application of Polymers, ed. by M.J. Bowden and S.R. Turner, ACS Advances in Chemistry Series 218, P. 109, American Chemical Society, Washington D.C. (1988)
  •  
  • 3. Willson CG, Proc. SPIE, 1262, 2 (1990)
  •  
  • 4. Schlegel L, Ueno T, Shiraish H, Hayashi N, Iwayanagi T, Chem. Mater., 2, 299 (1990)
  •  
  • 5. Allcock HRPhosphorous-Nitrogen Compound, Academic Press, New York, U.S.A. (1972)
  •  
  • 6. Minch MJ, SadiqShah S, J. Chem. Educ., 54, 11 (1977)
  •  
  • 7. McKean DR, Schaedel UP, MacDonald SA, J. Polym. Sci. A: Polym. Chem., 27, 3927 (1989)
  •  
  • 8. Thompson LF, Bowden MJIntroduction to Microlithography, ACS Symposium Series 219, Washington D.C. (1983)
  •  
  • Polymer(Korea) 폴리머
  • Frequency : Bimonthly(odd)
    ISSN 0379-153X(Print)
    ISSN 2234-8077(Online)
    Abbr. Polym. Korea
  • 2022 Impact Factor : 0.4
  • Indexed in SCIE

This Article

  • 1993; 17(3): 335-340

    Published online May 25, 1993

  • 10.7317/pk.
  • Received on Nov 30, -0001
  • Revised on Nov 30, -0001
  • Accepted on Nov 30, -0001

Correspondence to

  • E-mail: