Article

Development of Novel Photofunctional Polymers Formation of Amino Groups and Applications to Photoresists
Song KH
새로운 감광성 고분자의 개발-아미노기의 생성과 포토레지스트의 이용
송경헌

References

1. Bowden MJMaterials for Microlithography: Radiation-Sensitive Polymers, ed. by L.F. Thompson, ACS Symp. SEr, 266, p. 39, American Chemical Society, Washington, D.C. (1984)
2. BASF A.G., Ger. Patent, 2150691 (1971)
3. Weigert FJ, Proskow S, J. Imaging Sci., 31, 11 (1987)
4. Frechet JMJ, Tessier TG, Willson CG, Ito H, Macromolecules, 18, 317 (1985)
5. Shirai M, Tsunooka M, Tanaka M, Nishijima K, Ishikawa K, Chem. Express, 2, 707 (1987)
6. Hayase S, Onishi Y, Horiguchi R, J. Electrochem. Soc., 134, 2275 (1987)
7. Delzenne GA, Laridon U, Peeters H, Eur. Polym. J., 6, 93 (1970)
8. Reichmanis E, Wilkins CW, Chandross EA, J. Electrochem. Soc., 127, 2514 (1980)
9. Reichmanis E, Wilkins CWPolymer Materials for Electronic Applications, ed. by E.D. Feit, ACS Symp. Ser., 184, p. 29, American Chemical Society, Washington, D.C. (1982)
10. Reichmanis E, Wilkins CW, J. Electrochem. Soc., 132, 1178 (1985)
11. Hong SI, Kurosaki T, Okawara M, J. Polym. Sci. A: Polym. Chem., 12, 2553 (1974)
12. Tsunooka M, Kotera K, Tanaka M, J. Polym. Sci. A: Polym. Chem., 15, 107 (1977)
13. Tsunooka M, Imono S, Nakayama K, Kuwabara H, Tanaka M, J. Polym. Sci. A: Polym. Chem., 24, 317 (1986)
14. Song KH, Tsunooka M, Tanaka M, J. Photochem. Photobiol. A-Chem., 44, 197 (1988)
15. Song KH, Tonogai S, Tsunooka M, Tanaka M, J. Photochem. Photobiol. A-Chem., 49, 269 (1989)
16. Song KH, Urano A, Tsunooka M, Tanaka M, J. Polym. Sci. C: Polym. Lett., 25, 417 (1987)

Polymer(Korea) 폴리머
Frequency : Bimonthly(odd)
ISSN 0379-153X(Print)
ISSN 2234-8077(Online)
Abbr. Polym. Korea
2022 Impact Factor : 0.4
Indexed in SCIE